Czochralski silicon characterization by using thermoelectric
power measurements at high pressure
V.V. Shchennikova,
*, S.V. Gudinaa
, A. Misiukb
, S.N. Shamina
a
Institute of Metal Physics, Ural Division of RAS, GSP-170, S.Kovalevskoi str., 18, Ekaterinburg 620219, Russia
b
Institute of Electron Technology, Al. Lotnikow 32/46, Warsaw PL-02-668, Poland
发表于 2010-12-15 18:51:24
